WAFER ALIGNMENT DEVICE, AND WAFER CONVEYANCE DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a wafer alignment device that detects an edge of a wafer with high precision by removing influence of reflected light from the wafer, and to provide a wafer conveyance device using the same.;SOLUTION: The wafer alignment device including a rotating mechanism system which chucks the wafer and rotates it, a detection system which includes an optical sensor having a light projection unit for illuminating the edge of the wafer with light and a light reception unit for receiving the light, and monitors and detects the edge of the wafer, and a control system which outputs a signal for correcting the direction and eccentricity of the wafer according to the quantity of light obtained by the detection system is provided with a slit for suppressing spreading of the light between the light projection unit and light reception unit.;COPYRIGHT: (C)2010,JPO&INPIT