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After administering choice parent hydration treatment to the substrate surface which possesses the choice

机译:在进行选择后,对拥有选择权的基材表面进行水合处理

摘要

PROBLEM TO BE SOLVED: To selectively efficiently spread particulates in a desired region on a substrate by applying a selective hydrophilic treatment onto the surface of a substrate, having a hydrophobic surface and then sticking particulates only on the part subjected to the hydrophilic treatment. ;SOLUTION: A selective hydrophilic treatment is applied onto the surface of a substrate having a hydrophobic surface, and then an aqueous particulates dispersion is brought into contact with the surface of the substrate to stick the aqueous particulates dispersion to only the part subjected to the hydrophilic treatment. As the substrate having hydrophobic surface, any substrate having a hydrophobic surface may be used and there is no special limitation. For example, polyester such as polyethylene terephthalate and polyethylene naphthalate are exemplified. First, the selective hydrophilic treatment is applied to a disired region on the surface of the substrate to prepare the substrate having hydrophilic parts and hydrophobic parts on its surface. Next, the aqueous particulates dispersion is brought into contact with the surface of the substrate to cause the aqueous particulates dispersion to stick only to the part subjected to the hydrophilic treatment. Then, the parts is dried to stick the particulates to only the part subjected to the hydrophilic treatment.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:通过在具有疏水性表面的基材表面上进行选择性亲水处理,然后仅将颗粒粘附在经过亲水处理的零件上,以选择性地将微粒有效地散布在基材上的所需区域中。 ;解决方案:对具有疏水性表面的基材表面进行选择性亲水处理,然后使水分散液与基材表面接触,以使水分散液仅粘附在经过亲水处理的部分上治疗。作为具有疏水性表面的基材,可以使用任何具有疏水性表面的基材,没有特别限制。例如,示例了诸如聚对苯二甲酸乙二醇酯和聚萘二甲酸乙二醇酯的聚酯。首先,对基板表面上的不希望有的区域进行选择性亲水处理,以制备在其表面上具有亲水性部分和疏水性部分的基板。接下来,使颗粒状水分散体与基板的表面接触,以使颗粒状水分散体仅粘附至进行了亲水处理的部分。然后,将零件干燥以使颗粒仅粘附到经过亲水处理的零件上。;版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP4460685B2

    专利类型

  • 公开/公告日2010-05-12

    原文格式PDF

  • 申请/专利权人 宇部日東化成株式会社;

    申请/专利号JP19990227466

  • 发明设计人 田内 敏之;川島 淳二;

    申请日1999-08-11

  • 分类号G02F1/1339;

  • 国家 JP

  • 入库时间 2022-08-21 19:01:17

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