Being the substrate marginal central processing unit which choice administers

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and method for processing a substrate periphery capable of obtaining a desired etching width easily.;SOLUTION: A screening plate 19 is fixed to the lower end of a rotated shaft 20 arranged coaxially with a rotated shaft 13 of a spin base 12. The rotated shaft 20 is connected to a screening plate traverse drive mechanism 21 for moving the screening plate 19 in the plane direction of a substrate W. In the screening plate traverse drive mechanism 21, the rotated shaft 20 for rotating the screening plate 19 is connected to an arm. The arm is connected to one support member. In the support member, a nut section, where a screw shaft is screwed, is provided. The screw shaft is connected to the rotated shaft of a motor via other support members. The arm is moved in the plane direction on the substrate W by rotating the motor forward and backward.;COPYRIGHT: (C)2006,JPO&NCIPI