APPARATUS FOR GROWING LARGE AREA VANADIUM DIOXIDE THIN FILM AND METHOD OF GROWING LARGE AREA OXIDE THIN FILM IN THE APPARATUS

摘要

Provided is a technology for in-situ growing a large area VO₂ thin film which is an MIT material without using a conductive adhesive for high temperatures such as a silver paste. Generally, when a VO₂ thin film, which is an MIT material, is grown using a PLD or sputtering method under a high temperature, a conductive adhesive is used to improve thermal conduction. However, the thin film may be contaminated by the conductive adhesive and the conductive adhesive should be removed after growing the thin film. Therefore, adherence between the substrate and the surface of a heater when growing the thin film needs to be improved, and thus, a large area VO₂ thin film growing apparatus which may grow the large area VO₂ thin film easily and a method of growing the large area VO₂ thin film are provided.