Apparatus for growing large area vanadium dioxide thin film and method for growing large area oxide thin film in the same apparatus

摘要

the present invention for high temperature conductive adhesive (silver paste, and so on) used to do a large-area metal-insulator transition (MIT) material VO ₂ relates to a thin film deposition technique that can be in in-situ. PLD at a high temperature (Pulsed Laser Deposition), or the like metal sputter - the MIT material VO _{2 a} for high-temperature conductive adhesive used to increase the thermal time to grow and commonly used. However, the problems of such process occurs after the removal of the adhesive contamination and growth of thin film growth on glue. The present invention does not use a conductive adhesive for high temperatures, by solving the above problems to improve the adhesion of the thin film grown upon the substrate and the heater surface, excellent properties are large area VO ₂ a thin film than the conventional method The service can be easily grown in a large area and a large area device vanadium oxide thin film growth method of an oxide thin film growth in the growing apparatus.