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Structural and Photoelectric Properties of Epitaxially Grown Vanadium Dioxide Thin Films on c-Plane Sapphire and Titanium Dioxide

机译:c面蓝宝石和二氧化钛上外延生长的二氧化钒薄膜的结构和光电性能

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摘要

Vanadium dioxide (VO2) is one of the most extensively studied materials in the strongly correlated electron family capable of sustaining an insulator-to-metal transition. Here we present our studies of high-quality thin films of epitaxially grown VO2 on c-Al2O3(0001) and TiO2(001) via reactive DC pulsed magnetron sputtering. We present the structural transition probed via Reflection High Energy Electron Diffraction (RHEED) for the first time and we correlate the surface microstructure measurements with simulations before, during, and after the thermally induced transition. We also study the photoelectric conversion of VO2 on TiO2(001) and c-Al2O3(0001) under 405 nm light and demonstrate up to a 2000% increase in quantum efficiency as the power of the light is varied for VO2 on TiO2(001).
机译:二氧化钒(VO2)是在强相关电子族中能够承受绝缘体到金属过渡的最广泛研究的材料之一。在这里,我们介绍了我们通过反应性直流脉冲磁控溅射在c-Al2O3(0001)和TiO2(001)上外延生长VO2的高质量薄膜的研究。我们首次展示了通过反射高能电子衍射(RHEED)探测到的结构转变,并将表面微观结构测量结果与热诱发转变之前,之中和之后的模拟相关联。我们还研究了405 nm光下TiO2(001)和c-Al2O3(0001)上VO2的光电转换,并证明了随着TiO2(001)上VO2的光功率变化,量子效率提高了2000%。 。

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