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Power trench gate FET with active gate trenches that are contiguous with gate runner trench

机译:具有与栅极流道沟槽相邻的有源栅极沟槽的功率沟槽栅极FET

摘要

A trench-gated field effect transistor (FET) is formed as follows. Using one mask, a plurality of active gate trenches and at least one gate runner trench are defined and simultaneously formed in a silicon region such that (i) the at least one gate runner trench has a width greater than a width of each of the plurality of active gate trenches, and (ii) the plurality of active gate trenches are contiguous with the at least one gate runner trench.
机译:沟槽栅场效应晶体管(FET)如下形成。使用一个掩模,在硅区域中限定并同时形成多个有源栅极沟槽和至少一个栅极流道沟槽,使得(i)所述至少一个栅极流道沟槽的宽度大于所述多个沟槽中的每一个的宽度。有源栅沟槽中的至少一个包括:(ii)多个有源栅沟槽与至少一个栅极流道沟槽相邻。

著录项

  • 公开/公告号US7772642B2

    专利类型

  • 公开/公告日2010-08-10

    原文格式PDF

  • 申请/专利权人 BRUCE DOUGLAS MARCHANT;

    申请/专利号US20080241481

  • 发明设计人 BRUCE DOUGLAS MARCHANT;

    申请日2008-09-30

  • 分类号H01L29/76;

  • 国家 US

  • 入库时间 2022-08-21 18:48:29

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