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manufacturing process of an electronic device integrated in a semiconductor substrate of power at wide range of forbidden band and electronic device thus obtained

机译:集成在功率禁带范围大的功率的半导体衬底中的电子设备的制造方法以及由此获得的电子设备

摘要

An embodiment of a process for manufacturing an electronic device on a semiconductor body of a material with wide forbidden bandgap having a first conductivity type. The process comprises the steps of: forming, on the semiconductor body, a first mask having a first window and a second window above a first surface portion and a second surface portion of the semiconductor body; forming, within the first and second surface portions of the semiconductor body underneath the first and second windows, at least one first conductive region and one second conductive region having a second conductivity type, the first conductive region and the second conductive region facing one another; forming a second mask on the semiconductor body, the second mask having a plurality of windows above surface portions of the first conductive region and the second conductive region; forming, within the first conductive region and the second conductive region and underneath the plurality of windows, a plurality of third conductive regions having the first conductivity type; removing completely the first and second masks; performing an activation thermal process of the first, second, and third conductive regions at a high temperature; and forming body and source regions.
机译:在具有第一导电类型的具有宽禁带宽度的材料的半导体本体上制造电子器件的方法的实施例。该工艺包括以下步骤:在半导体本体上形成具有在半导体本体的第一表面部分和第二表面部分上方的第一窗口和第二窗口的第一掩模;在第一和第二窗口下方的半导体本体的第一和第二表面部分中形成至少一个具有第二导电类型的第一导电区域和一个第二导电区域,第一导电区域和第二导电区域彼此面对;在半导体本体上形成第二掩模,该第二掩模在第一导电区域和第二导电区域的表面部分上方具有多个窗口;在第一导电区域和第二导电区域内以及在多个窗口下方形成具有第一导电类型的多个第三导电区域;完全去除第一和第二掩膜;在高温下对第一,第二和第三导电区域进行活化热处理;并形成体区和源区。

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