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Theoretical predicted high-thermal-conductivity cubic Si3N4 and Ge3N4: promising substrate materials for high-power electronic devices

机译:理论预测的高导热立方晶Si3N4和Ge3N4:大功率电子设备的有前途的衬底材料

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摘要

Ceramic substrates play key roles in power electronic device technology through dissipating heat, wherein both high thermal conductivity and mechanical strength are required. The increased power of new devices has led to the replacement of Al2O3 by high thermal conducting AlN and further β-Si3N4 based substrates. However, the low mechanical strength and/or anisotropic mechanical/thermal properties are still the bottlenecks for the practical applications of these materials in high power electronic devices. Herein, using a combination of density functional theory and modified Debye-Callaway model, two new promising substrate materials γ-Si3N4 and γ-Ge3N4 are predicted. Our results demonstrate for the first time that both compounds exhibit higher room temperature thermal conductivity but less anisotropy in expansion and heat conduction compared to β-Si3N4. The mechanism underpins the high RT κ is identified as relatively small anharmonicity, high phonon velocity and frequency. The suitability of these two nitrides as substrate materials was also discussed.
机译:陶瓷基板通过散热来在电力电子设备技术中发挥关键作用,其中既需要高导热率又需要机械强度。新设备功率的增加导致高导热AlN以及其他基于β-Si3N4的衬底替代了Al2O3。但是,低机械强度和/或各向异性机械/热性能仍然是这些材料在高功率电子设备中实际应用的瓶颈。在此,结合密度泛函理论和改进的Debye-Callaway模型,预测了两种新的有前途的衬底材料γ-Si3N4和γ-Ge3N4。我们的结果首次证明,与β-Si3N4相比,这两种化合物均具有较高的室温热导率,但在膨胀和热传导方面的各向异性较小。高RTκ的机制被确定为相对较小的非谐性,较高的声子速度和频率。还讨论了这两种氮化物作为基材的适用性。

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