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METHOD FOR DETERMINING DEFECTS IN SUBSTRATE AND AN APPARATUS FOR EXPOSING SUBSTRATE IN LITHOGRAPHY PROCESS, CAPABLE OF DETERMINING EXISTENCE OF DEFECTS USING DEVIATION OF FRACTION
METHOD FOR DETERMINING DEFECTS IN SUBSTRATE AND AN APPARATUS FOR EXPOSING SUBSTRATE IN LITHOGRAPHY PROCESS, CAPABLE OF DETERMINING EXISTENCE OF DEFECTS USING DEVIATION OF FRACTION
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机译:光刻工艺中基质缺陷的测定方法和基质曝光装置,能够利用分度偏差来确定缺陷的存在
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摘要
PURPOSE: A method for determining defects in a substrate and an apparatus for exposing a substrate in a lithography process are provided to determine existence of defects in the substrate, by detecting variations of fraction measured across the scan range.;CONSTITUTION: An illuminator system(IL) is constituted to condition a radiation beam(B). A substrate table(WT) is constituted to keep a substrate(W). Scan range of the substrate is scanned using a sensor projecting the radiation beam on the substrate. Fraction of the intensity of the radiation reflected from different substrate regions following the scan range is measured. Variations of the fraction measured across the scan range are determined. Existence of defects in the substrate is determined from the variations.;COPYRIGHT KIPO 2010
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