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Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
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机译:确定基板中的缺陷的方法和用于在光刻工艺中曝光基板的设备
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摘要
Method of determining defects in a substrate, the method comprising: scanning a scan range of the substrate with a sensor, the sensor projecting a beam of radiation on the substrate; measuring the fraction of the intensity of the radiation reflected from different substrate areas along the scan range; determining the variations of the measured fraction across the scan range; determining from the variations whether any defects are present in the substrate.
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