COMPOUND FOR CVD AND A CHEMICAL VAPOR DEPOSITION METHOD FOR A RUTHENIUM FILM OR A RUTHENIUM COMPOUND FILM, CAPABLE OF IMPROVING STABILITY AND VAPOR PRESSURE

摘要

PURPOSE: A compound for CVD and a chemical vapor deposition method for a ruthenium film or a ruthenium compound film are provided to provide an organic ruthenium compound, and to improve stability and vapor pressure.;CONSTITUTION: A compound for CVD is composed of an organic ruthenium compound. The organic ruthenium compound is formed by coordinating two beta-diketones and two organic ligands with a ruthenium. Olefin coordinating in the ruthenium is one of ethylene, propylene, 2-methyl propylene, butane, and 1,3-butadiene. Nitrile coordinating in the ruthenium is acetonitrile or acrylonitrile.;COPYRIGHT KIPO 2010