首页> 外国专利> NOZZLE ASSEMBLY AND A SUBSTRATE PROCESSING APPARATUS USING THE SAME, CAPABLE OF UNIFORMLY SUPPLYING A CHEMICAL ON THE ENTIRE OF A SUBSTRATE

NOZZLE ASSEMBLY AND A SUBSTRATE PROCESSING APPARATUS USING THE SAME, CAPABLE OF UNIFORMLY SUPPLYING A CHEMICAL ON THE ENTIRE OF A SUBSTRATE

机译:喷嘴组件和使用该组件的基板处理设备,能够在整个基板上均匀地供应化学药品

摘要

PURPOSE: A nozzle assembly and a substrate processing apparatus using the same are provided to prevent the contamination of a nozzle base and a swing nozzle by flowing a chemical from the swing nozzle along a streamlined external tube.;CONSTITUTION: A nozzle base(320) is expanded to a longitudinal direction. A swing nozzle(340) is connected to the end of the nozzle base and includes a spray hole for a chemical. A driving shaft(371) provides rotation torque to the rotation center axis of the swing nozzle. A driving motor(374) includes a rotational shaft which is connected to the driving shaft. A concave groove is formed on the end of the driving shaft.;COPYRIGHT KIPO 2010
机译:目的:提供喷嘴组件和使用该喷嘴组件的基板处理设备,以防止来自摆动喷嘴的化学物质沿流线型外管流动,从而防止喷嘴基座和摆动喷嘴受到污染。;构成:喷嘴基座(320)沿纵向扩展。摆动喷嘴(340)连接到喷嘴基座的端部,并且包括用于化学品的喷孔。驱动轴(371)向旋转喷嘴的旋转中心轴提供旋转转矩。驱动马达(374)包括连接到驱动轴的旋转轴。在驱动轴的末端形成一个凹槽。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100052113A

    专利类型

  • 公开/公告日2010-05-19

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20080111001

  • 发明设计人 LEE TAEK YOUB;

    申请日2008-11-10

  • 分类号H01L21/02;H01L21/00;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:46

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