METHOD FOR INSPECTING PHOTOMASK WRITING OUT THE JOB FILE FOR THE SEMICONDUCTOR EXPOSURE APPRATUS

摘要

PURPOSE: In the method for inspecting photomask, the step of inspecting the accuracy of the job file it inspects is included the residue of the top of the substrate.;CONSTITUTION: The job file for the semiconductor exposure apparatus for the second process lighting is made(S110). The first process is advanced in the top of the substrate in which the main area and frame area defined and the light shield layer main pattern is formed in the main area. The light shield layer frame pattern is formed in the frame area.;COPYRIGHT KIPO 2011