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Vision and scanning probes inspect photomask defects: To check critical dimensions., advanced metrology systems combine visible-light microscopy with stylus nanoprofilometry

机译:视觉和扫描探针检查光掩模缺陷:为了检查关键尺寸,先进的计量系统将可见光显微镜与测针纳米轮廓仪相结合

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摘要

As digital-electronics clock speeds advance past 1 or 2 GHz, semiconductor manufacturers have to fabricate chips whose critical dimensions (CDs) are much smaller than a wavelength of light. The active elements in a digital IC are field-effect switching transistors, and the speed at which they can switch goes up as the gate width goes down. The minimum manufacturable gate width thus determines the maximum clock speed. Chipmakers look to semiconductor-manufacturing equipment vendors such as FEI Company to provide tools capable of reliably fabricating these structures.
机译:随着数字电子时钟速度超过1或2 GHz,半导体制造商必须制造其临界尺寸(CD)远小于光波长的芯片。数字IC中的有源元件是场效应开关晶体管,随着栅极宽度的减小,它们的开关速度会加快。最小的可制造栅极宽度因此决定了最大时钟速度。芯片制造商希望半导体制造设备供应商(例如FEI Company)提供能够可靠地制造这些结构的工具。

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