FORMATION METHOD OF A SELF-ASSEMBLED MONOLAYER TO PREVENT THE VOID AND THE SEAM IN A COPPER WIRE OF A SEMICONDUCTOR DEVICE, AND A PRODUCING METHOD THE COPPER WIRE OF THE SEMICONDUCTOR DEVICE USING THEREOF

摘要

PURPOSE: A formation method of a self-assembled monolayer, and a producing method the copper wire of the semiconductor device using thereof are provided to secure the high reliability of the self-assembled monolayer by forming a copper seed film with the uniform thickness.;CONSTITUTION: A formation method of a self-assembled monolayer comprises the following steps: reforming a semiconductor substrate to have a hydrogen radical on the surface; irradiating UV rays to bond a Cl radical on the surface of the semiconductor substrate, while supplying Cl_2 gas; and supplying NH_3 gas to the surface of the semiconductor substrate to substitute the Cl radical to an amine radical.;COPYRIGHT KIPO 2011