A method for reducing of irregularities, during the chemically - mechanical polishing of micro structure components by use of cmp - encrustation in a glazed state

摘要

In complex cmp - recipes, the material removal on the basis of a chemically reactive abrasive material and a low pressing force is achieved, wherein the surface topography finally a material layer achieved is improved in that at least in a final phase, a glazed state of the polishing pad is applied.