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GAN-BASED MOS FIELD-EFFECT TRANSISTOR

机译:基于GAN的MOS场效应晶体管

摘要

PROBLEM TO BE SOLVED: To provide a GaN-based MOSFET that is enabled to perform normally-off operation and can have its threshold voltage freely controlled.;SOLUTION: The GaN-based MOSFET 10 has a gate insulating film 15 formed between an electron traveling layer 13 made of p-GaN and a gate electrode 18. The gate electrode 18 is made of AlGaInP mixed crystal. The gate electrode 18 includes a first gate layer 19 made of p-type AlGaInP mixed crystal, a second gate layer 20 formed thereupon and made of p-type GaAs, and a metal layer (AuGe/Au electrode) 21 formed thereupon. The threshold voltage can be controlled by varying the mixed crystal ratio of the AlGaInP mixed crystal.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:提供一种能够执行常关操作并且可以自由控制其阈值电压的GaN基MOSFET;解决方案:GaN基MOSFET 10具有在电子传播之间形成的栅极绝缘膜15由p-GaN制成的层13和栅电极18。栅电极18由AlGaInP混合晶体制成。栅电极18包括由p型AlGaInP混合晶体制成的第一栅层19,在其上形成并由p型GaAs制成的第二栅层20,以及在其上形成的金属层(AuGe / Au电极)21。可以通过改变AlGaInP混合晶体的混合晶体比例来控制阈值电压。; COPYRIGHT:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011129607A

    专利类型

  • 公开/公告日2011-06-30

    原文格式PDF

  • 申请/专利权人 FURUKAWA ELECTRIC CO LTD:THE;

    申请/专利号JP20090284785

  • 发明设计人 SATO YOSHIHIRO;

    申请日2009-12-16

  • 分类号H01L21/338;H01L29/812;H01L29/778;H01L29/78;H01L21/28;H01L29/423;H01L29/49;

  • 国家 JP

  • 入库时间 2022-08-21 18:22:21

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