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LATERAL GAN-BASED ENHANCEMENT JUNCTION FIELD-EFFECT TRANSISTOR DEVICE AND PREPARATION METHOD THEREFOR

机译:基于横向GaN的增强结场效应晶体管器件及其制备方法

摘要

A lateral GaN-based enhancement junction field-effect transistor device and a preparation method therefor. According to the device, by means of grooving and epitaxial regrowth or ion implantation, multiple vertical strip structures p-GaN are obtained on an n-GaN substrate, and form multiple thin p-n junction lateral n-type channels with the n-GaN substrate; then, by means of the control of the channel thickness and p-type and n-type doping concentrations, the n-type channels are in the fully depleted state of the built-in electric field of a p-n junction under zero bias, that is, the device is in an off state, and a forward bias needs to be applied to make the channels in an on state, that is, the device has a positive threshold voltage. In addition, the multiple channels ensure the large current output of the device.
机译:基于横向GaN的增强结场效应晶体管装置及其制备方法。根据该装置,通过凹槽和外延再生或离子注入,在N-GaN衬底上获得多个垂直条带结构P-GaN,并用N-GaN衬底形成多个薄的P-n结横向n型通道;然后,借助于控制沟道厚度和p型和n型掺杂浓度,n型通道处于零偏置下的PN结的内置电场的完全耗尽状态。 ,该设备处于关闭状态,并且需要应用前向偏差以使通道处于ON状态,即,设备具有正阈值电压。此外,多个通道确保设备的大电流输出。

著录项

  • 公开/公告号WO2021072812A1

    专利类型

  • 公开/公告日2021-04-22

    原文格式PDF

  • 申请/专利权人 NANJING UNIVERSITY;

    申请/专利号WO2019CN114216

  • 申请日2019-10-30

  • 分类号H01L29/10;H01L29/808;H01L21/336;

  • 国家 CN

  • 入库时间 2022-08-24 18:22:44

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