首页> 外国专利> Being the fluorine-containing thin film which is formed to the production mannered null backing material surface of the backing material which

Being the fluorine-containing thin film which is formed to the production mannered null backing material surface of the backing material which

机译:作为形成于基材的制造上没有基材的表面的含氟薄膜,

摘要

PROBLEM TO BE SOLVED: To obtain a fluorine-containing thin film excellent in the adhesion with a base material and also excellent in dimensional precision and mold releasability as a precise mold.;SOLUTION: The fluorine-containing thin film is formed on the surface of the base material and constituted by simultaneously depositing a fluorine-containing organic substance, which can be deposited by a vapor deposition method, and a substance, which can be deposited by an ion beam sputtering method, on the surface of the base material. The fluorine-containing organic substance is a perfluoro type polymer and this polymer contains at least one double bond carbon or triple bond carbon and a -COOH group or an -Si(OR)3 group (wherein R is an alkyl group) in its molecule. The fluorine-containing organic substance is an amorphous perfluoro resin.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:为了得到与基材的密合性优异,并且作为精密模具的尺寸精度和脱模性优异的含氟薄膜。解决方法:在表面上形成含氟薄膜。通过在基材的表面上同时沉积可以通过气相沉积法沉积的含氟有机物质和可以通过离子束溅射法沉积的物质来构成基材。含氟有机物质是全氟型聚合物,并且该聚合物包含至少一个双键碳或三键碳和-COOH基团或-Si(OR) 3 基团(其中R为分子中的一个烷基)。含氟有机物质是无定形全氟树脂。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4585798B2

    专利类型

  • 公开/公告日2010-11-24

    原文格式PDF

  • 申请/专利权人 株式会社ティー アンド ケー;

    申请/专利号JP20040176398

  • 发明设计人 杉山 大樹;遠藤 俊哉;

    申请日2004-06-15

  • 分类号B32B27/30;B29C33/62;C23C14/06;C23C14/22;B29K27/12;

  • 国家 JP

  • 入库时间 2022-08-21 18:18:00

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号