首页> 外国专利> Fluorescent film, film forming method of fluorescent film, dielectric multilayer film, optical element, optical system, imaging unit, optical characteristic measuring apparatus, optical characteristic measuring method, exposure apparatus, exposure method, and device manufacturing method

Fluorescent film, film forming method of fluorescent film, dielectric multilayer film, optical element, optical system, imaging unit, optical characteristic measuring apparatus, optical characteristic measuring method, exposure apparatus, exposure method, and device manufacturing method

机译:荧光膜,荧光膜的成膜方法,电介质多层膜,光学元件,光学系统,成像单元,光学特性测量设备,光学特性测量方法,曝光设备,曝光方法和器件制造方法

摘要

Including a base material made of a fluoride capable of transmitting ultraviolet light, and an activator doped in the base material, wherein the activator includes a transition element or a rare earth element, and the ultraviolet light is irradiated in the base material. And a dielectric multilayer film having the fluorescent film, and an optical element, an image pickup apparatus, an optical characteristic measuring apparatus, an exposure apparatus, an exposure method, and a device using the fluorescent film. Production method.
机译:包括由能够透射紫外线的氟化物制成的基础材料和掺杂在该基础材料中的活化剂,其中该活化剂包括过渡元素或稀土元素,并且在该基础材料中照射紫外线。以及具有荧光膜和光学元件的电介质多层膜,摄像装置,光学特性测定装置,曝光装置,曝光方法以及使用该荧光膜的装置。生产方法。

著录项

  • 公开/公告号JPWO2009113544A1

    专利类型

  • 公开/公告日2011-07-21

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20100502834

  • 发明设计人 江面 嘉信;石沢 均;

    申请日2009-03-10

  • 分类号C09K11/85;C09K11;C09K11/64;C09K11/61;C09K11/66;C09K11/67;G01M11/02;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:39

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