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Optical method of measuring the thickness of optical films in devices

机译:测量设备中光学膜厚度的光学方法

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Abstract: When the films in the optical or photoelectric devices are produced, usually their thickness is an important parameter. The optical method can be used to measure real-time thickness of films if films are producing on the transparent substrates. Based on thin optics, the principles of measuring thickness of optical films by optical method are expounded in the paper. The measuring instruments are developed. The instruments can measure real-time the optical reflectivity of films during producing them. By processing and analyzing data the thickens of the films can be estimated. The measuring system has been applied in the courses producing experimental tubes and image intensifiers. The measured results are given and analyzed. !2
机译:摘要:在光学或光电设备中生产薄膜时,通常其厚度是重要的参数。如果在透明基板上产生薄膜,则可以使用光学方法测量薄膜的实时厚度。阐述了基于薄光学的光学方法测量光学薄膜厚度的原理。开发了测量仪器。该仪器可以在生产过程中实时测量薄膜的光学反射率。通过处理和分析数据,可以估计薄膜的厚度。该测量系统已应用于生产实验管和图像增强器的课程。给出并分析了测量结果。 !2

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