METHOD OF DEPOSITING AMORPHUS ALUMINIUM OXYNITRIDE LAYER BY REACTIVE SPUTTERING OF AN ALUMINIUM TARGET IN A NITROGEN/OXYGEN ATMOSPHERE

摘要

A method of depositing an amorphous layer of AlON includes providing an aluminium sputter target in a chamber, exposing the target and chamber to O₂ to saturate the exposed surfaces with oxygen, introducing a substrate into the chamber in an atmosphere containing at least nitrogen and oxygen, and sputtering the target in the nitrogen and oxygen atmosphere to deposit an amorphous AlON film.