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Pulsed power magnetron sputtering of a niobium target in reactive oxygen and/or nitrogen atmosphere

机译:在反应性氧和/或氮气氛中的铌靶的脉冲功率磁控溅射

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The behavior of a niobium target during magnetron sputtering in reactive oxygen and/or nitrogen atmosphere using a pulsed power supply has been investigated. No arcing was observed at any deposition conditions. Deposition rates in the system Nb–O–N were in the range of 0.8–3.6 Am/h. The highest rates were found for low oxygen flows in the Nb–O system. The chemical composition, morphology and crystallographic structure of deposited Nb–O and Nb–O–N coatings have been studied by energy dispersive X-ray spectroscopy, scanning electron microscopy and X-ray diffraction, respectively. Hardness measurements were performed using the instrumented indentation test. As for other Me–O–N systems (Me=metal) the oxygen has a strong influence on the chemical composition of the Nb oxynitride coatings due to its higher reactivity compared with nitrogen. Nb–O coatings deposited at oxygen gas flows >5 sccm look transparent, at lower oxygen gas flows the coatings appear metallic. Oxygen gas flows >5 sccm do not influence the chemical composition or hardness of the coatings appreciably (saturation effect). Additions of nitrogen shift the transition ‘‘metallic–transparent’’ to lower oxygen gas flows. Nb–O and Nb– O–N coatings seem to be X-ray amorphous. The hardness of the transparent Nb–O–N coatings is lower than the hardness of a metallic niobium coating.
机译:研究了使用脉冲电源的反应性氧和/或氮气氛中磁控溅射期间的铌靶的行为。在任何沉积条件下没有观察到电弧。系统NB-O-N中的沉积速率在0.8-3.6AM / h的范围内。对于NB-O系统的低氧气流量,找到了最高速率。通过能量分散X射线光谱,扫描电子显微镜和X射线衍射,研究了沉积的Nb-O和Nb-O-N涂层的化学成分,形态和晶体结构。使用仪表压痕测试进行硬度测量。至于其他ME-O-N系统(ME =金属)由于其与氮气相比的较高反应性,氧对Nb氮氧化物涂层的化学成分产生了强烈影响。在氧气流动下沉积的Nb-O涂层> 5 sccm看起来透明,在较低的氧气流动下,涂层出现金属。氧气流量> 5 sccm不会显着影响涂层的化学成分或硬度(饱和效果)。氮气将过渡''金属透明''移入较低的氧气流动。 NB-O和NB-O-N涂层似乎是X射线无定形。透明NB-O-N涂层的硬度低于金属铌涂层的硬度。

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