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Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers

机译：目标的相对氧化状态作为沉积光学质量RF反应磁控溅射Al2O3层的指南

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Carlijn I. van Emmerik; Ward A. P. M. Hendriks; Martijn M. Stok; Michiel de Goede; Lantian Chang; Meindert Dijkstra; Frans Segerink; Dominic Post; Enrico G. Keim; Mike J. Dikkers; Sonia M. García-Blanco;
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1. Structural, electrical and optical properties of SnO2-x : F-layers deposited by DC-reactive magnetron-sputtering from a metallic target in Ar-O-2/CF4 mixtures [J] . Mientus R., Ellmer K. Surface & Coatings Technology . 1998,第1a3期

机译：SnO2-x的结构，电学和光学性质：通过直流反应磁控溅射从Ar-O-2 / CF4混合物中的金属靶沉积的F层
2. A study on optical, morphological and mechanical properties of Al2O3 ultra-thin films deposited by RF reactive magnetron sputtering [J] . Pat Suat, Ozen Soner, Senay Volkan, International Journal of Surface Science and Engineering . 2015,第5期

机译：RF反应磁控溅射沉积Al2O3超薄膜的光学，形貌和力学性能研究
3. Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering [J] . Tomoyuki Kumada, Makoto Ohtsuka, Hiroyuki Fukuyama AIP Advances . 2015,第1期

机译：衬底温度对RF反应磁控溅射沉积AlN层晶体质量的影响
4. Comparison of the optical properties of oxide films deposited by reactive-dc-magnetron sputtering with those of ion-beam-sputtered and electron-beam-evaporated films [C] . Bradley J. Pond, Tu C. Du, J.Sobczak S. Systems Corp. Albuquerque NM USA, Annual boulder damage symposium on optical materials for high-power lasers . 1994

机译：反应性-DC-磁控溅射与离子束溅射和电子束蒸发膜沉积的氧化膜光学性质的比较
5. Novel Thin Film Transparent Conducting Oxides Deposited by DC Reactive Magnetron Sputtering. [D] . Stevens, Blake LeRoy. 2010

机译：直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
6. Effects of N2 Partial Pressure on Growth Structure and Optical Properties of GaN Nanorods Deposited by Liquid-Target Reactive Magnetron Sputter Epitaxy [O] . Muhammad Junaid, Ching-Lien Hsiao, Yen-Ting Chen, 2018

机译：N2分压对液靶反应磁控溅射外延沉积GaN纳米棒生长结构和光学性能的影响
7. Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering [O] . Tomoyuki Kumada, Makoto Ohtsuka, Hiroyuki Fukuyama 2015

机译：衬底温度对射频磁控溅射制备alN层晶体质量的影响

Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers

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