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Method for making a charge balanced multi-nano shell drift region for superjunction semiconductor device

机译:用于超结半导体器件的电荷平衡多纳米壳漂移区的制造方法

摘要

A method is disclosed for making a substantially charge balanced multi-nano shell drift region (MNSDR) for superjunction semiconductor devices atop a base substrate. The MNSDR has numerous concentric nano shell members NSM1, NSM2, . . . , NSMM (M1) of alternating, substantially charge balanced first conductivity type and second conductivity type and with height NSHT. First, a bulk drift layer (BDL) is formed atop the base substrate. A substantially vertical cavity of pre-determined shape and size and with depth NSHT is then created into the top surface of BDL. The shell members NSM1, NSM2, . . . , NSMM are successively formed inside the vertical cavity, initially upon its vertical walls then moving toward its center, so as to successively fill the vertical cavity till a residual space remains therein. A semi-insulating or insulating fill-up nano plate is then formed inside the residual space to fill it up.
机译:公开了一种用于在基础衬底上制造用于超结半导体器件的基本上电荷平衡的多纳米壳漂移区(MNSDR)的方法。 MNSDR具有许多同心纳米壳成员NSM 1 ,NSM 2 、。 。 。 ,NSSM M (M> 1)交替交替,基本上是电荷平衡的第一导电类型和第二导电类型,高度为NSHT。首先,在基础衬底的顶部上形成体漂移层(BDL)。然后在BDL的顶面中创建一个具有预定形状和大小,深度为NSHT的基本垂直的空腔。 Shell成员NSM 1 ,NSM 2 、。 。 。 NSM M 依次形成在垂直腔内部,首先在其垂直壁上移动,然后向其中心移动,以连续填充垂直腔,直到其中保留有剩余空间。然后在剩余空间内形成半绝缘或绝缘的填充纳米板以将其填充。

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