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Multi-chip packaging using an interposer with through-vias

机译:使用具有通孔的中介层进行多芯片封装

摘要

One embodiment relates to forming a plurality of vias extending partially through a body, the vias including sidewalls defined by the body. An insulating layer is formed on the sidewalls and on an upper surface of the body. An electrically conductive layer is formed on the insulating layer, the electrically conductive layer defining first metal pads on the upper surface and second metal pads in contact with the first metal pads, the second metal pads having a denser pitch than the first metal pads. A dielectric layer is formed between adjacent first metal pads and between adjacent second metal pads. A plurality of electronic elements are coupled to the second metal pads. After the coupling the elements, the body is thinned through a lower surface. A portion of the insulating layer in the vias is removed and the electrically conductive layer is coupled to a substrate.
机译:一个实施例涉及形成多个部分地延伸穿过主体的通孔,该通孔包括由主体限定的侧壁。绝缘层形成在主体的侧壁和上表面上。在绝缘层上形成导电层,该导电层在上表面上限定第一金属焊盘以及与第一金属焊盘接触的第二金属焊盘,第二金属焊盘的间距比第一金属焊盘的间距大。在相邻的第一金属焊盘之间以及相邻的第二金属焊盘之间形成电介质层。多个电子元件耦合到第二金属焊盘。在连接元件之后,主体通过下表面变薄。去除通孔中的绝缘层的一部分,并且将导电层耦合至基板。

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