BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR PATTERN-FORMING COMPRISING SAID PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD USING SAID PHOTOSENSITIVE RESIN COMPOSITION, AND ARTICLE

摘要

Disclosed is a photosensitive resin composition that has excellent resolution, low cost, and wherein there is a wide range of structurally applicable options for a polymer precursor wherein the reaction towards an end product is promoted by means of a basic substance or by means of heating under the presence of a basic substance. Further disclosed is a base-generating agent that can be used in this type of photosensitive resin composition. The base-generating agent is characterized by having a specific structure and by generating a base by means of heating and being irradiated by electromagnetic waves, and the photosensitive resin composition is characterized by containing the polymer precursor that promotes the reaction towards an end product by means of said base-generating agent and a basic substance or by means of heating under the presence of a basic substance.