首页> 外国专利> BASE-GENERATING AGENT PHOTOSENSITIVE RESIN COMPOSITION PATTERN-FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION PATTERN FORMATION METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND ARTICLE

BASE-GENERATING AGENT PHOTOSENSITIVE RESIN COMPOSITION PATTERN-FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION PATTERN FORMATION METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND ARTICLE

机译:包括光敏树脂组成和制造方法的光敏树脂组成图案形成方法的碱产生剂光敏树脂组成图案形成材料

摘要

the present invention is to Formula 1 as an indication that the electromagnetic irradiation and by heating the base It relates to a generator for generating a base. The present invention sensitivity is excellent, and regardless of the base generating agent available for the type of polymer precursors, a photosensitive resin composition containing a base generator of the present invention, the exposure portion and a large-soluble contrast in the unexposed portion is obtained, the shape It can be obtained a good pattern. and R & 1 &
机译:发明内容本发明涉及式1作为电磁辐射并通过加热基体的指示。本发明涉及用于产生基体的发生器。本发明的灵敏度优异,并且不管可用于聚合物前体的类型的碱生成剂如何,均获得了包含本发明的碱生成剂,曝光部分和未曝光部分中的大的可溶对比度的感光性树脂组合物。 ,形状可以获得良好的花纹。和R& 1>

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