BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR PATTERN-FORMING COMPRISING SAID PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD USING SAID PHOTOSENSITIVE RESIN COMPOSITION, AND ARTICLE

摘要

An object of the present invention is excellent in resolution is , at low cost , the basic material the range of heating by or basic by the presence of the substance of the polymer precursor in the final product of the reaction is promoted structure applicable optional to provide a wide light-sensitive resin composition and a base generator available in the photosensitive resin composition such that the . Having a specific structure , characterized in that the base generator that generates a base upon irradiation with electromagnetic waves in the heating , and promote the reaction of the final product by the relevant base generating agent , and heating under the presence of a basic substance or a basic substance by a photosensitive resin composition characterized by containing a polymer precursor .