首页> 外国专利> PHASE CHANGE MEMORY DEVICE INCLUDING A NANO-WIRE NETWORK SINGLE ELEMENT-BASED PHASE CHANGE LAYER IN A POROUS OXIDE LAYER AND A METHOD FOR MANUFACTURING THE SAME, CAPABLE OF SIMULTANEOUSLY FORMING A SINGLE ELEMENT-BASED PHASE CHANGE LAYER AND A NANO-WIRE NETWORK PHASE CHANGE LAYER

PHASE CHANGE MEMORY DEVICE INCLUDING A NANO-WIRE NETWORK SINGLE ELEMENT-BASED PHASE CHANGE LAYER IN A POROUS OXIDE LAYER AND A METHOD FOR MANUFACTURING THE SAME, CAPABLE OF SIMULTANEOUSLY FORMING A SINGLE ELEMENT-BASED PHASE CHANGE LAYER AND A NANO-WIRE NETWORK PHASE CHANGE LAYER

机译:相变存储装置,包括多孔氧化层中基于纳米线网络的单元素相变层,以及制造该相变存储器的方法,能够同时形成基于单元素的相变层和纳米相层

摘要

PURPOSE: A phase change memory device and a method for manufacturing the same are provided to ensure fine contact area in a phase change layer by forming nano-wire network using a porous oxide layer.;CONSTITUTION: An interlayer insulating layer(100) is formed on a semiconductor substrate. A lower electrode(110) is formed on the interlayer insulating layer. A porous insulating layer(120) is formed on the lower electrode. A single element-based phase change layer(130) is formed on the porous insulating layer. An upper electrode(140) is formed on the phase change layer. In case of the formation of the single element-based phase change layer, a nano-wire network phase change layer is simultaneously formed in the porous insulating film.;COPYRIGHT KIPO 2011
机译:目的:提供一种相变存储器件及其制造方法,以通过使用多孔氧化物层形成纳米线网络来确保相变层中的精细接触面积。组成:形成层间绝缘层(100)在半导体衬底上。在层间绝缘层上形成下部电极(110)。在下部电极上形成多孔绝缘层(120)。在多孔绝缘层上形成基于单元素的相变层(130)。上电极(140)形成在相变层上。在形成基于单元素的相变层的情况下,在多孔绝缘膜中同时形成纳米线网络相变层。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20100137627A

    专利类型

  • 公开/公告日2010-12-31

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20090055763

  • 发明设计人 LEE TAE YEON;

    申请日2009-06-23

  • 分类号H01L21/8247;H01L27/115;

  • 国家 KR

  • 入库时间 2022-08-21 17:53:04

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