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HUME REMOVAL WAFER CLEANING CONTAINER CAPABLE OF PREVIOUSLY PREVENTING THE MALFUNCTION OF A WAFER SENSOR AND A WAFER CLEANING DEVICE INCLUDING THE SAME
HUME REMOVAL WAFER CLEANING CONTAINER CAPABLE OF PREVIOUSLY PREVENTING THE MALFUNCTION OF A WAFER SENSOR AND A WAFER CLEANING DEVICE INCLUDING THE SAME
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机译:能够自动防止晶片传感器和晶片清洁装置(包括同一个)故障的除湿晶片清洁容器
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摘要
PURPOSE: A hume removal wafer cleaning container and a wafer cleaning device including the same are provided to effectively remove the hume on the outer side of a cleaning bath by spraying pure water. ;CONSTITUTION: A cleaning bath stores cleaning solutions. A hume removing unit(130) is arranged in the outside of the cleaning bath and sprays pure water to the cleaning bath. The hume removing unit includes a spray nozzle(132), a time valve(134), and a pump(136). The time valve is connected to the spray nozzle and periodically controls a tube. The pump is connected to the time valve and provides pure water.;COPYRIGHT KIPO 2011
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