首页> 外国专利> HUME REMOVAL WAFER CLEANING CONTAINER CAPABLE OF PREVIOUSLY PREVENTING THE MALFUNCTION OF A WAFER SENSOR AND A WAFER CLEANING DEVICE INCLUDING THE SAME

HUME REMOVAL WAFER CLEANING CONTAINER CAPABLE OF PREVIOUSLY PREVENTING THE MALFUNCTION OF A WAFER SENSOR AND A WAFER CLEANING DEVICE INCLUDING THE SAME

机译:能够自动防止晶片传感器和晶片清洁装置(包括同一个)故障的除湿晶片清洁容器

摘要

PURPOSE: A hume removal wafer cleaning container and a wafer cleaning device including the same are provided to effectively remove the hume on the outer side of a cleaning bath by spraying pure water. ;CONSTITUTION: A cleaning bath stores cleaning solutions. A hume removing unit(130) is arranged in the outside of the cleaning bath and sprays pure water to the cleaning bath. The hume removing unit includes a spray nozzle(132), a time valve(134), and a pump(136). The time valve is connected to the spray nozzle and periodically controls a tube. The pump is connected to the time valve and provides pure water.;COPYRIGHT KIPO 2011
机译:目的:提供一种除尘晶片清洗容器和包括该容器的晶片清洗装置,以通过喷射纯水有效地除去清洗槽外侧上的腐殖质。 ;组成:一个清洗浴槽,用于存放清洗液。在清洗槽的外部配置有除尘单元(130),向清洗槽喷射纯水。除雾单元包括喷嘴(132),时间阀(134)和泵(136)。时间阀连接到喷嘴并定期控制软管。泵连接到时间阀并提供纯净水。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110077263A

    专利类型

  • 公开/公告日2011-07-07

    原文格式PDF

  • 申请/专利权人 LG SILTRON INCORPORATED;

    申请/专利号KR20090133776

  • 发明设计人 CHO HUI DON;JEONG EUN DO;SEO YOON KYO;

    申请日2009-12-30

  • 分类号H01L21/302;

  • 国家 KR

  • 入库时间 2022-08-21 17:51:30

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