首页> 外国专利> PATTERN PROJECTION DEVICE AND LASER PROCESSING DEVICE

PATTERN PROJECTION DEVICE AND LASER PROCESSING DEVICE

机译:图案投影设备和激光处理设备

摘要

PROBLEM TO BE SOLVED: To provide a pattern projection device and a laser processing device capable of preventing deterioration of a spatial optical modulation element.SOLUTION: A laser processing device 100 according to the present invention includes: a spatial optical modulation element 45 for spatially modulating a laser beam emitted from a laser source 41 by a plurality of mirrors; an illumination optical system including an illumination system 36 for illuminating a substrate 1; an imaging lens 38 for projecting modulation light spatially modulated by the spatial optical modulation element 45 on a target object; and a deflection element 46 for deflecting the travelling direction of the laser beam output from the spatial optical modulation element 45 in a direction coinciding with an optical axis of the imaging lens 38. In the spatial optical modulation element 45, the travelling direction of laser beam incident on the spatial optical modulation element 45 is approximately parallel to a normal line of a reference surface of the spatial optical modulation element 45.
机译:解决的问题:提供一种能够防止空间光调制元件劣化的图案投影装置和激光处理装置。解决方案:根据本发明的激光处理装置100包括:用于空间调制的空间光调制元件45。通过多个反射镜从激光源41发射的激光束;一种照明光学系统,包括照明系统36,用于照明基板1。成像透镜38,用于将由空间光调制元件45进行空间调制后的调制光投射到被摄体上。偏转元件46,用于使从空间光调制元件45输出的激光的行进方向向与摄像透镜38的光轴一致的方向偏转。在空间光调制元件45中,激光的行进方向入射在空间光调制元件45上的入射光大致平行于空间光调制元件45的参考面的法线。

著录项

  • 公开/公告号JP2012118375A

    专利类型

  • 公开/公告日2012-06-21

    原文格式PDF

  • 申请/专利权人 OLYMPUS CORP;

    申请/专利号JP20100269196

  • 发明设计人 NAKAMURA TATSUYA;

    申请日2010-12-02

  • 分类号G02B26/08;B23K26/073;B23K26/06;B23K26/04;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 17:43:21

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号