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The method of making the amorphous carbon membrane of conformation accumulate plasma strengthening chemical vapor phase growth (PECVD) with
The method of making the amorphous carbon membrane of conformation accumulate plasma strengthening chemical vapor phase growth (PECVD) with
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机译:构造无定形碳膜的方法是积累等离子体增强化学气相生长(PECVD)
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摘要
Methods and apparatus for depositing an amorphous carbon layer on a substrate are provided. In one embodiment, a deposition process includes positioning a substrate in a substrate processing chamber, introducing a hydrocarbon source having a carbon to hydrogen atom ratio of greater than 1:2 into the processing chamber, introducing a plasma initiating gas selected from the group consisting of hydrogen, helium, argon, nitrogen, and combinations thereof into the processing chamber, with the hydrocarbon source having a volumetric flow rate to plasma initiating gas volumetric flow rate ratio of 1:2 or greater, generating a plasma in the processing chamber, and forming a conformal amorphous carbon layer on the substrate.
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