SEMICONDUCTOR DEVICE WITH A GATE HAVING A BULBOUS AREA AND A FLATTENED AREA UNDERNEATH THE BULBOUS AREA AND METHOD FOR MANUFACTURING THE SAME

摘要

A semiconductor device with a gate having a bulbous area and a flattened area underneath the bulbous area is presented. The semiconductor device includes a semiconductor substrate, an isolation layer, a gate insulation layer, and gates. The semiconductor substrate has recess parts that have first grooves which have bulbous-shaped profiles and second vertically flattened profile grooves which extend downward from the first grooves. The gates are formed in the recess parts in which the gate insulation layer is double layered in the bulbous profile areas and is single layered in the flattened profile areas.