首页> 外国专利> WAFER LEVEL REFLOW EQUIPMENT FOR A SOLDER BALL AND FLIP CHIP ASSEMBLIES CAPABLE OF IMPROVING THE TEMPERATURE UNIFORMITY OF THE SURFACE OF A WAFER AND A MANUFACTURING METHOD THEREOF

WAFER LEVEL REFLOW EQUIPMENT FOR A SOLDER BALL AND FLIP CHIP ASSEMBLIES CAPABLE OF IMPROVING THE TEMPERATURE UNIFORMITY OF THE SURFACE OF A WAFER AND A MANUFACTURING METHOD THEREOF

机译:能够改善晶片表面温度均匀性的焊球和倒装芯片组件的晶片级回流设备及其制造方法

摘要

PURPOSE: Wafer level reflow equipment for a solder ball and flip chip assemblies and a manufacturing method thereof are provided to improve solder bump yield by regularly maintaining the temperature of a solder bump on a wafer.;CONSTITUTION: A heating chuck(26) is arranged on a support pillar(24). The heating chuck includes a lower part heating plate(26a), a middle heating plate(26b), and a top heating plate(26c). IR(Infrared ray) temperature detection apparatuses(30a, 30b) receive an infrared ray to measure the area temperature of a wafer. The IR temperature detection apparatus regularly maintains the temperature of the solder bump on the wafer. A controller(32) controls the heating output of each heater.;COPYRIGHT KIPO 2012
机译:目的:提供一种用于焊球和倒装芯片组件的晶圆级回流焊设备及其制造方法,以通过定期保持晶圆上焊料凸点的温度来提高焊料凸点的产量。;构成:装有加热卡盘(26)在支撑柱上(24)。该加热卡盘包括下部加热板(26a),中间加热板(26b)和顶部加热板(26c)。 IR(红外线)温度检测设备(30a,30b)接收红外线以测量晶片的区域温度。 IR温度检测装置定期维持晶片上的焊料凸点的温度。控制器(32)控制每个加热器的加热输出。; COPYRIGHT KIPO 2012

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号