PLASMA CHAMBER WHICH INCLUDES A FEEDING APPARATUS FOR A MULTI-DIVISION ELECTRODE SET CAPABLE OF GENERATING UNIFORM PLASMA WITH LARGE AREA

摘要

PURPOSE: A plasma chamber which includes a feeding apparatus for a multi-division electrode set is provided to shield high frequency power radiated to the air, thereby minimizing radiation loss during a high frequency power feeding process to the multi-division electrode set.;CONSTITUTION: A plasma chamber(200) comprises a plurality of unit division electrodes(212) and a multi-division electrode set(210) comprised of a ground electrode(214). High frequency power is supplied to the multi-division electrode set through an impedance matching device(110), a feeding part(120), and a voltage level control part(130) from a power supply source(100). The feeding part supplies power to the multiple unit division electrodes by distributing the high frequency power generated in the power supply source. The voltage level control part is comprised between the unit division electrode and each output terminal of a final branch structure of the feeding part.;COPYRIGHT KIPO 2012