METHOD FOR FABRICATING SOLAR CELL APPLICATIONS USING INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A method for manufacturing a solar cell using an inductively coupled plasma chemical vapor deposition method is provided to increase the lifetime of a carrier by forming an intrinsic layer at a temperature of 250 to 350 degrees centigrade. CONSTITUTION: A solar cell includes a first electrode(210), a first layer(220), an intrinsic layer(230), a second layer(240), and a second electrode(250). Mixed gas includes hydrogen gas and silane gas. A ratio of SiH4 to (SiH4 + H2) is 0.016 to 0.02. The second layer, the intrinsic layer, and the first layer are composed of a crystallized silicon layer.