RESIST COMPOSITION, A RESIST FILM USING THE SAME, AND A METHOD FOR FORMING PATTERNS CAPABLE OF REDUCING WATER MARK DEFECTS OF THE PATTERNS

摘要

PURPOSE: A resist composition, a resist film using the same, and a method for forming patterns are provided to form resist patterns and to improve the shape of the resist patterns.;CONSTITUTION: A resist composition includes a first resin, compound, a second resin, and a mixed solvent. The dissolution of the first resin to an alkali developing solution is increased based on decomposition under the action of acid. The compound is represented by general formula I or II and generates acid based on the irradiation of active ray or radiation ray. The second resin includes either fluorine atom or silicon atom. The mixed solvent is based on a first solvent and a second solvent. Either boiling point of the first solvent or the second solvent is 200 degrees Celsius or more.;COPYRIGHT KIPO 2012