Compound, method for producing the same, composition, optical component forming composition, film forming composition for lithography, resist composition, resist pattern forming method, radiation sensitive composition, method for producing amorphous film, lower layer for lithography Film forming material, composition for forming underlayer film for lithography, method for producing underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

摘要

A compound represented by the following formula (1) and a production method thereof, and a composition, a composition for forming an optical component, a film-forming composition for lithography, a resist composition, a method for forming a resist pattern, a radiation-sensitive composition, A method for producing an amorphous film, a material for forming a lower layer film for lithography, a composition for forming a lower layer film for lithography, a method for producing a lower layer film for lithography, a method for forming a resist pattern, a method for forming a circuit pattern, and a purification method. (1) (In the formula (1), R1 is a 2n-valent group or a single bond having 1 to 60 carbon atoms, and R2 to R5 are each independently a straight chain having 1 to 30 carbon atoms. A branched, cyclic or cyclic alkyl group, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a group represented by the following formula (A), a group represented by the following formula (B), A thiol group or a hydroxyl group, wherein at least one selected from the group consisting of R2 to R5 is selected from the group consisting of a group represented by the following formula (A) and a group represented by the following formula (B) M2 and m3 are each independently an integer of 0 to 8, m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4 and m5 are simultaneously 0 and N is an integer of 1 to 4, and p2 to p5 are each independently an integer of 0 to 2. (A) (In formula (A), each R6 is independently an alkylene group having 1 to 4 carbon atoms and m 'is an integer of 1 or more.) (B) (Formula (B In the formula, R6 is as defined above, R7 is a hydrogen atom or a methyl group, and m ″ is 0 or an integer of 1 or more.))