RESIST COMPOSITION AND A METHOD FOR MANUFACTURING RESIST PATTERNS USING THE SAME CAPABLE OF IMPROVING THE CRITICAL DIMENSION UNIFORMITY OF RESIST PATTERNS

摘要

PURPOSE: A resist composition and a method for manufacturing resist patterns using the same are provided to prevent the generation of defects on resist patterns.;CONSTITUTION: A resist composition includes a structural unit represented by chemical formula aa, a resin represented by chemical formula ab, and an acid generator. In chemical formula aa, Raa1 is a hydrogen element or a methyl group; Aaa1 is a substitutable C1 to C6 alkandiyl group or a group represented by chemical formula a-1; and Raa2 is substitutable C1 to C18 aliphatic hydrocarbon group, and one or more CH_2 moieties are capable of being substituted with O moieties or CO moieties. In chemical formula a-1, s is 0 or 1; X10 and X11 are respectively oxygen elements, carbonyl groups, carbonyl oxy groups, or oxycarbonyl groups; A10, A11, and A12 are respectively substitutable C1 to C5 aliphatic hydrocarbon groups; and * represents the bond to -O-C(O)-Raa2 moiety.;COPYRIGHT KIPO 2012