Polymeric Self-Assembled Monolayers. 3. Pattern Transfer by Use ofPhotolithography, Electrochemical Methods and an Ultrathin Self-Assembled Diacetylenic Resist

摘要

We report that a self-assembled monolayer (SAM) composed of diacetylenicorganomercaptans can be used as a negative photolithographic resist. We demonstrate that the image of a transmission electron microscope minigrid can be etched into a Au substrate using a three step approach. First, we expose the masked SAM-modified Au substrate to UV light to induce polymerization of the diacetylene molecules in the unmasked regions. Second, we electrochemically strip the unpolymerized resist from the substrate. Finally, we use a chemical etchant to preferentially remove Au from the unexposed regions of the surface.