POLYMER MATERIAL FOR SELF-ASSEMBLY, SELF-ASSEMBLED FILM, METHOD FOR PRODUCING SELF-ASSEMBLED FILM, PATTERN, AND METHOD FOR FORMING PATTERN

摘要

Provided is a polymer material for self-assembly, a self-assembled film, a method for producing a self-assembled film, a pattern, and a method for forming a pattern all of which are capable of reducing defects based on faulty microscopic phase separation sites and capable of forming a fine, minute pattern. The polymer material for self-assembly of the present invention contains a multi-block copolymer of a triblock copolymer or more containing a first polymer block containing a structural unit having a specific structure and a second polymer block containing a structural unit having a specific structure. The first polymer block and the second polymer block are coupled with each other.