LOW DIELECTRIC THIN FILM AND A METHOD FOR MANUFACTURING THE SAME TO IMPROVE THE DIELECTRIC CONSTANT AND MECHANICAL PROPERTIES THROUGH A SIMPLE PROCESS

摘要

PURPOSE: A low dielectric thin film and a method for manufacturing the same are provided to obtain a low dielectric constant and thermal stability at the same time by using a linear or nonlinear organic/inorganic precursor.;CONSTITUTION: A method for manufacturing a low dielectric thin film comprises a step of chemical deposition of a silane compound, in which allyl group of 1:0.1-1:10 is contained under oxidizing gas, and a pore-forming material using plasma and a step of heat treatment. The silane compound containing allyl group is selected from the group consisting of allyltrimethylsilane, allyltriethylsilane, allyltrimethoxysilane, allyltriethoxysilane, allyltripropylsilane, allyltripropoxysilane, and their mixture. The pre-forming material is selected from the group consisting of a benzene compound including allyl group, a nonlinear hydrocarbon compound including epoxy group, cyclohexane, toluene, norbornene, terpinene, xylene, linear alkene, nonlinear unsaturated hydrocarbon, and their mixture.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Reactive material; (BB) Oxidizing gas