PHOTOMASK SUBSTRATE, PHOTOMASK, PHOTOMASK SUBSTRATE SET, PHOTOMASK SET, METHOD FOR MANUFACTURING PHOTOMASK AND PATTERN TRANSFER METHOD

摘要

PURPOSE: A substrate for a photo-mask, the photo-mask, a substrate set for the photo-mask, a photo-mask set, a manufacturing method of the photo-mask, and a pattern transferring method are provided to improve the overlapping precision of patterns when a target is being transferred with a plurality of photo-masks. CONSTITUTION: A substrate for a photo-mask forms transferring patterns(112p) on a main surface. The maximum value of height fluctuation in the pattern region of the main surface, Zmax, is 8.5um or less. Measurement points are set on the basis of a pre-determined distance P, and each height of the measurement points to the reference surface is Z. the difference between the maximum Z and the minimum Z is the Zmax. P is more than or equal to 5mm and is less than or equal to 15mm. A manufacturing method of the photo-mask includes the following: the substrate is prepared; an optical film is formed on the main surface of the substrate; and the optical film is patterned to form the transferring patterns. [Reference numerals] (501) Light source; (502) Light illuminating system