首页> 外国专利> ELECTROLESS PLATING METHOD INCLUDING A CLEANER PROCESS FOR ELIMINATING FOREIGN MATERIALS STICKING TO A PLATED OBJECT DURING AN INJECTION MOLDING PROCESS

ELECTROLESS PLATING METHOD INCLUDING A CLEANER PROCESS FOR ELIMINATING FOREIGN MATERIALS STICKING TO A PLATED OBJECT DURING AN INJECTION MOLDING PROCESS

机译:包括清洁剂过程的化学镀覆方法,用于消除注塑过程中异物对平板物体的撞击

摘要

PURPOSE: An electroless plating method including a cleaner process is provided to enhance adhesion between an object and a copper plated material by removing foreign materials from the object and precisely adjusting the surface of the object.;CONSTITUTION: An electroless plating method comprises a pretreatment process, an electroless copper plating process, a catalyst treatment process, a post treatment process, and a washing and drying process. The pretreatment process comprises a cleaner process, in which an object is dipped in a cleaner treatment liquid of 20-50°C for 30 seconds to 5 minutes and then washed in order to remove foreign materials from the surface of the object, and an ultrasonic degreasing process, in which buff gas is removed from the surface of the object. The cleaner treatment liquid is prepared by mixing 5-10wt.% of sodium bisulfite and 1-5wt.% of H2SO4(Sulfuric Acid) into 85-90wt.% of pure water.;COPYRIGHT KIPO 2012
机译:目的:提供一种包括更清洁工艺的化学镀方法,以通过从物体上去除异物并精确地调节物体表面来增强物体与镀铜材料之间的附着力;组成:化学镀方法包括预处理工艺,化学镀铜工艺,催化剂处理工艺,后处理工艺以及洗涤和干燥工艺。预处理过程包括清洁器过程,其中将物体浸入20-50℃的清洁剂处理液中30秒至5分钟,然后洗涤以从物体表面去除异物,然后进行超声波处理。脱脂过程,其中将抛光气体从物体表面去除。通过将5-10wt。%的亚硫酸氢钠和1-5wt。%的H2SO4(硫酸)混合到85-90wt。%的纯水中来制备清洁剂处理液。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR101167568B1

    专利类型

  • 公开/公告日2012-08-23

    原文格式PDF

  • 申请/专利权人 DOJIN P&I IND. CO. LTD.;

    申请/专利号KR20120004289

  • 发明设计人 LEE SANG JIN;

    申请日2012-01-13

  • 分类号C23C18/16;C23C18/18;H01Q1/24;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:45

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