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HOLDING MATERIAL FOR GAS-PROCESSING DEVICE, GAS-PROCESSING DEVICE, AND METHOD RELATING TO THE SAME
HOLDING MATERIAL FOR GAS-PROCESSING DEVICE, GAS-PROCESSING DEVICE, AND METHOD RELATING TO THE SAME
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机译:气体处理设备的保持材料,气体处理设备以及与其相关的方法
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摘要
PROBLEM TO BE SOLVED: To provide a holding material for a gas-processing device, the gas-processing device and a method relating to the same in which appropriate control of friction resistance between the holding material and a casing is achieved.SOLUTION: A gas-processing method is provided for processing a gas by using a gas-processing device including: a processing structure (20); a metallic casing (30) for housing the processing structure; and an inorganic fiber holding material (10) that is disposed between the processing structure and the casing. Between the holding material and the casing, an organic polymer (40) is disposed so as to come in contact with the outer surface (11) of the holding material and the inner surface (31) of the casing during processing of the gas. The gas is processed under the condition that the temperature of the casing is at or above the softening temperature of the organic polymer and less than the decomposition temperature of the organic polymer.
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