VACUUM ARC-TYPE EVAPORATION SOURCE AND VACUUM ARC DEPOSITION METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a vacuum arc-type evaporation source capable of controlling macroparticles adhered to a substrate by a vacuum arc deposition method.;SOLUTION: The vacuum arc-type evaporation source includes a rod-like or plate-like cathode 3 comprising a material to be evaporated, a spacer part 16 provided on the surface opposite to the evaporation surface of the cathode, and a backing plate 10 to which the spacer part 16 is attached, wherein the cross-sectional area perpendicular to the axial direction of the spacer part 16 is made smaller than the cross-sectional area perpendicular to the thickness direction of the cathode.;COPYRIGHT: (C)2013,JPO&INPIT