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EVAPORATION SOURCE DEVICE FOR VACUUM ARC DEPOSITION, AND VACUUM ARC DEPOSITION SYSTEM
EVAPORATION SOURCE DEVICE FOR VACUUM ARC DEPOSITION, AND VACUUM ARC DEPOSITION SYSTEM
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机译:真空弧沉积的蒸发源设备和真空弧沉积系统
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摘要
PROBLEM TO BE SOLVED: To provide an evaporation source device for vacuum arc deposition by which, even in the case a cathode of which the contact part with a trigger electrode tends to be locally consumed, the service life of the cathode is elongated, vacuum arc deposition treatment can be continued even without frequently exchanging the cathode, and therefore, a thin film-coated article prepared by vacuum arc deposition can be provided at high productivity and hence at a low cost, and to provide a vacuum arc deposition system provided with the evaporation source device.;SOLUTION: The evaporation source device 3 of the vacuum arc deposition system includes a cathode 32 as an evaporation source and a trigger electrode 38 for triggering arc discharge confronted with the discharge face of the cathode 32. The cathode 32 includes an outer cylinder part 321 and a core part 322 engaged in the outer cylindrical part 321 so as to be movable toward the trigger electrode 38. The trigger electrode 38 is arranged so as to be confronted with the discharge face 322a of the core part 322. Further, an apparatus 5 for controlling the mutual contact pressure of the discharge face 322a of the core part and the trigger electrode 38 is provided.;COPYRIGHT: (C)2004,JPO
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