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EVAPORATION SOURCE DEVICE FOR VACUUM ARC DEPOSITION, AND VACUUM ARC DEPOSITION SYSTEM

机译:真空弧沉积的蒸发源设备和真空弧沉积系统

摘要

PROBLEM TO BE SOLVED: To provide an evaporation source device for vacuum arc deposition by which, even in the case a cathode of which the contact part with a trigger electrode tends to be locally consumed, the service life of the cathode is elongated, vacuum arc deposition treatment can be continued even without frequently exchanging the cathode, and therefore, a thin film-coated article prepared by vacuum arc deposition can be provided at high productivity and hence at a low cost, and to provide a vacuum arc deposition system provided with the evaporation source device.;SOLUTION: The evaporation source device 3 of the vacuum arc deposition system includes a cathode 32 as an evaporation source and a trigger electrode 38 for triggering arc discharge confronted with the discharge face of the cathode 32. The cathode 32 includes an outer cylinder part 321 and a core part 322 engaged in the outer cylindrical part 321 so as to be movable toward the trigger electrode 38. The trigger electrode 38 is arranged so as to be confronted with the discharge face 322a of the core part 322. Further, an apparatus 5 for controlling the mutual contact pressure of the discharge face 322a of the core part and the trigger electrode 38 is provided.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种用于真空电弧沉积的蒸发源装置,即使在其阴极易于与触发电极接触的部分被局部消耗的情况下,通过该蒸发源装置,也可以延长阴极的使用寿命,真空电弧即使不频繁地更换阴极,也可以继续进行沉积处理,因此,可以以高生产率且因此以低成本提供通过真空电弧沉积制备的薄膜涂覆制品,并提供一种具有真空电弧沉积系统的真空电弧沉积系统。解决方案:真空电弧沉积系统的蒸发源装置3包括作为蒸发源的阴极32和用于触发与阴极32的放电面相对的电弧放电的触发电极38。阴极32包括一个阴极。外筒部321和以能够向触发电极38移动的方式接合在外筒部321中的芯部322。芯部38的放电面322a与芯部322的放电面322a相对。此外,设有控制芯部322的放电面322a和触发电极38的相互接触压力的装置5。日本特许厅(C)2004

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