Microplasma ion source for focused ion beam applications

摘要

A high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe⁺ and/or Xe₂⁺ ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm² or higher for focused ion beam applications.